Bhandi neMugwagwa: Kushandira Pamwe, Kuwirirana uye Kukunda-Kukunda
zvigadzirwa

Zvigadzirwa

Tri-n-propylsilane CAS:998-29-8

Tri-n-propylsilane ikemikari inoumbwa nemapoka matatu e-n-propyl akabatanidzwa neatomu resilicon. Inowanzoshandiswa se reagent mukugadzirwa kweorganic uye senzira yekugadzirira ma silane anoshanda ane mashandisirwo akasiyana-siyana musainzi yezvinhu uye catalysis.


Ruzivo rweChigadzirwa

Matagi eChigadzirwa

Kushandiswa uye Mhedzisiro:

Tri-n-propylsilane inowana mashandisirwo akasiyana-siyana mumakemikari echisikigo, sainzi yezvinhu, uye maitiro emaindasitiri nekuda kwekuita kwayo zvakasiyana uye hunhu hwayo. Iyi compound inoshanda zvinangwa zvakasiyana-siyana munzvimbo dzakasiyana, ichiratidza kushanduka kwayo uye kushanda kwayo. Mukugadzirwa kweorganic, Tri-n-propylsilane inoshanda sechinhu chinodzikisa kana kuti chinoshandura silylating reagent, ichibatsira kushandurwa kwemapoka anoshanda mumamorekuru akaomarara. Kugona kwayo kupa mahydride uye kugadzira stable silyl derivatives kunoita kuti ive yakakosha pakugadzirisa organic compounds uye kuwana maumbirwo matsva emakemikari. Materials science inoshandisa Tri-n-propylsilane pakugadzira zvinhu zvakagadzirwa nesilicon, zvakaita sesilicones, ceramics, uye mafirimu matete. Nekubatanidza iyi compound panguva yekugadzira zvinhu, vaongorori vanogona kugadzirisa hunhu hwakaita sekunyorova kwepamusoro, kunamira, uye kugadzikana kwekupisa kwekushandiswa kwakananga mumagetsi, machira, uye biomaterials. Mu catalysis, Tri-n-propylsilane inoshanda se catalyst kana co-catalyst mukuita kwakasiyana-siyana, kusanganisira cross-coupling reactions, hydrogenations, uye hydrosilylations. Basa rayo mukusimudzira kushanda zvakanaka kwe reaction, kusarudza, uye mamiriro akapfava zvinoita kuti ive chishandiso chakakosha chekukurumidzisa shanduko dzemakemikari mukutsvaga kwedzidzo uye kugadzirwa kwemaindasitiri. Uyezve, Tri-n-propylsilane ine mashandisirwo mukugadzira semiconductor, uko inoshandiswa senzira yekuisa mafirimu ane silicon kuburikidza ne chemical vapor deposition (CVD) kana atomic layer deposition (ALD). Aya mafirimu esilicon anoita basa rakakosha mukugadzira zvishandiso zvemagetsi, masero ezuva, uye microelectromechanical systems (MEMS). Kazhinji, mashandisirwo akawanda eTri-n-propylsilane anoratidza kukosha kwayo mukusimudzira synthetic chemistry, materials engineering, uye maindasitiri. Mipiro yayo inotangira pakugonesa organic transformations uye materials synthesis kusvika pakuvandudza catalytic reactions uye semiconductor device production, zvichisimbisa kukosha kwayo se reagent inoshanda zvakasiyana-siyana munzvimbo dzakasiyana dzesainzi netekinoroji.

Muenzaniso weChigadzirwa:

Upfu hweAmino acid 1
Upfu hweAmino acid2

Kurongedza Chigadzirwa:

Upfu hweAmino acid 3
Upfu hweAmino acid4
Upfu hweAmino acid5
Upfu hweAmino acid6

Mamwe Mashoko:

Kuumbwa C9H22Si
Kuyedza 99%
Chitarisiko upfu chena
Nhamba yeCAS 998-29-8
Kurongedza Diki uye rakakura
Hupenyu hweSherufu makore maviri
Kuchengetera Chengeta munzvimbo inotonhorera uye yakaoma
Chitupa ISO.

 


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